This brief shows how the asymmetrical behavior of hot-electron modified MOSFET's with respect to swapping of source and drain is due to two-dimensional effects taking place within the transition region separating the device channel from the terminal junctions. In particular experimental data concerning enhanced threshold-voltage shift, asymmetrical transconductance, anomalous body effect, as well as short-channel-like behavior exhibited by the stressed transistors, are presented and discussed.
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Lombardi et al. (1983) studied this question.
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