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April 1, 1972Journal of Applied Physics

Method for Detecting Fine Structure in the Secondary Electron Emission Yield and the Application to Si(111)

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Authors

KGKeisuké GotoNagoya Institute of TechnologyKIKazuo IshikawaNihon University

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Goto et al. (1972) studied this question.

synapsesocial.com/papers/6a73156da7d283abeec22d40https://doi.org/10.1063/1.1661361
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