Photovoltage formation across Si and GaAs p-n junctions exposed to laser radiation is experimentally investigated. When the photon energy is lower than semiconductor forbidden energy gap, the photovoltage is found to consist of two components, U = U f + U ph . The first one Uf is fast having polarity of thermoelectromotive force of hot carriers. The second one Uph is slow component of opposite polarity, and it is caused by electron-hole pair generation due to two-photon absorption. Uph was shown to decrease with the rise of radiation wavelength due to diminution of two-photon absorption coefficient with wavelength. Predominance of each separate component in the formation of the net photovoltage depends on both laser wavelength and intensity.
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Ašmontas et al. (2017) studied this question.