Ellipsometric $in~situ$ study of the titanium surfaces during the anodization

The titanium surfaces immersed in 0.5 mol.dm-3 H2SO4 and anodized in the voltage region from 0 to 100 V have been studied by in situ ellipsometric measurements. The thickness, inhomogeneity, and porosity of the formed films rise with increasing applied voltage. A computational method is presented for obtaining both the refractive indices and thickness of an unknown film on a reflecting substrate of know optical constants. The complex index of refraction and thickness of generated films were calculated comparing the theoretical computed curve with experimental loci Δ and Ψ obtained from in situ ellipsometric measurements.