Ar-O₂ plasma of resonant UHF discharge for chitosan's films processed

This article explores the modification of chitosan films by treating Ar-O₂ with microwave plasma. The main idea is to use resonant plasma generation methods to treat chitosan films. Spectral and energy characteristics of microwave plasma are obtained. The mechanical properties, swelling, and solubility of chitosan films exposed to microwave plasma are studied. The dependence of film properties on the duration of treatment with resonant microwave plasma is demonstrated.