The deposition process of a single droplet on the liquid film is numerically simulated by the Moving Particle Semi-implicit (MPS) method to analyze the possibility and effect of splash occurring in Boiling Water Reactor (BWR) condition. A simple one-dimensional mixture model is used to calculate the necessary parameters for the simulation of deposition. The rationality of the model is confirmed by comparison with the experimental results. A film buffer model is developed to arrange the simulation results. A correlation of the critical impact Weber number for splash is obtained. It is found that splash and subsequent re-entrainment process is significant and cannot be ignored in the high quality condition in BWR.
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Xie et al. (2004) studied this question.
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