Mechanical relaxations and 1/fnoise in Bi, Nb, and Fe films

Anelastic piezoresistance and 1/f noise were measured in the same samples to compare mechanical relaxations with 1/f noise. In bismuth below 200 K, both effects could be fitted to a model invoking one class of mobile defects. In niobium, both the anelastic piezoresistance and the noise scaled with the concentration of dissolved hydrogen. A well-defined peak in noise versus temperature was observed without any peak in the anelastic response. In iron, noise apparently from a carbon Snoek relaxation was observed at 220 K in a sample with high impurity concentration and at 300 K with low impurity concentration. No anelastic feature was found at 220 K in the high-impurity-concentration sample. The broad nature of 1/f noise appears to arise not from a fundamental source but from the generally poor quality of thin films.