Ultra low dielectric, self-cleansing and highly oleophobic POSS-PFCP aryl ether polymer composites

Ultra low dielectric constant (k = 1.53) materials with self-cleansing properties were synthesized via incorporation of fluorodecyl-polyhedral oligomeric silsesquioxane (FD-POSS) into recently synthesized perfluorocyclopentenyl (PFCP) aryl ether polymers. Incorporation of fluorine rich, high free volume, and low surface energy POSS into a semifluorinated PFCP polymer matrix at various weight percentages resulted in a dramatic drop in dielectric constant, as well as a significant increase in hydrophobicity and oleophobicity of the system. These ultra-low dielectric self-cleansing materials (θtilt = 38°) were fabricated into electrospun mats from a solvent blend of fluorinated FD-POSS with PFCP polymers.