Homogeneous thick film (∼0.10 mm) of high dielectric K0.05Ti0.02Ni0.93O; abbreviated as KTNO/polyvinylidene fluoride (PVDF) composite has been prepared by hot-molding technique. The frequency and temperature dependent dielectric behavior of this composite has been studied by varying the KTNO volume fraction (fKTNO). Near the percolation threshold (fKTNO=0.40), a large enhancement of effective dielectric permittivity (εeff∼400 which is 40 times higher than that of pure PVDF) with low loss (∼0.20 at 1 kHz) is observed. The experimental εeff data have been fitted with different theoretical models and found to follow percolation theory successfully. Such a high εeff and low loss flexible dielectric material appears to be suitable for technological applications.
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Bhadra et al. (2010) studied this question.
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