The sputter deposition of thin magnetic NiMnSb films on MgO(001) and Si(001) is investigated by in situ x-ray scattering. It is shown that the roughness of the layers as a function of the film thickness increases according to power laws with unusually large growth exponents. The optimum growth conditions are found on the substrate MgO(001) at temperatures of 250 °C during the deposition.
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Schlomka et al. (2000) studied this question.
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