Answers are grounded in this paper and cite their sources.
Cuprous oxide is widely known to be a native p -type semiconductor. Despite this, reports of electrodeposited films of n -type Cu 2 O continue to appear in the literature, with oxygen vacancies commonly implicated as the electron-donating defect. Through first-principles calculations, we demonstrate conclusively that intrinsic n -type defects or defect complexes in Cu 2 O cannot be the source of any n -type behavior displayed by electrodeposited samples. In light of these results, we discuss the experimental findings.
No takes yet. Share an insight, caveat, or question.
Scanlon et al. (2010) studied this question.
Synapse has enriched 5 related papers. Consider them for comparative context: