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March 18, 2003Journal of the American Chemical Society

A Photocurable Poly(dimethylsiloxane) Chemistry Designed for Soft Lithographic Molding and Printing in the Nanometer Regime

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Authors

KCKyung Moon ChoiYonsei UniversityJRJohn A. RogersNorthwestern University

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Choi et al. (2003) studied this question.

synapsesocial.com/papers/6a7944febdf697b3de0229cchttps://doi.org/10.1021/ja029973k
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