High efficiency InGaAs/GaAs single-quantum-well lasers using single-step metalorganic chemical vapor deposition

Low-threshold-current single-quantum-well InGaAs/GaAs lasers are fabricated by metalorganic chemical vapor deposition on a nonplanar substrate. By taking advantage of the growth rate and doping differences on different crystal facets during the growth, a buried heterostructure laser with natural current blocking p-n-p-n junction is formed by a single growth step. Threshold currents as low as 1.0 mA under pulsed operation and 1.2 mA under continuous-wave operation are obtained for uncoated lasers at room-temperature. The lasers showed high external quantum efficiency (80%) and high T/sub 0/ (150 K). High reflection coated laser (95%/95%) have CW threshold current as low as 0.28 mA.>