Patterning of Thin‐Film Microstructures on Non‐Planar Substrate Surfaces Using Decal Transfer Lithography

Soft-lithographic patterning of thin-film material microstructures supported on spherically curved lenses (see Figure) using an extension of decal transfer lithography (DTL) is reported. These processes have been used to successfully create a pattern of amorphous silicon and gold thin-film microstructures with feature sizes ranging from 2 μm to 75 μm. This has been achieved without noticeable defects using wet and reactive-ion etching processes across large substrate areas.