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The photo-leakage-current (IPLC) characteristic of F incorporated a-Si:H thin film transistor (TFT) has been studied. The device activation energy (Ea) of a-Si:H(:F) TFTs is higher than those of typical a-Si:H TFTs, and resulted in the shift down of Fermi level in a-Si:H(:F). Experimental results show that the IPLC of a-Si:H(:F) TFTs is smaller than that of conventional a-Si:H TFTs in the density of states limited region, stemmed from the higher recombination centers present in a-Si:H(:F) material. However, the higher IPLC is observed in the hole conduction region, resulted from the larger Ea in the a-Si:H(:F) TFTs.
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Wang et al. (2007) studied this question.
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