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April 7, 2007Chemistry of Materials181 citations

Selective Growth and MOCVD Loading of Small Single Crystals of MOF-5 at Alumina and Silica Surfaces Modified with Organic Self-Assembled Monolayers

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SHStephan HermesDZDenise ZacherABA. Baunemann

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Abstract

Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO 2, ALD-Al 2 O 3 proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al 2 O 3 substrates were demonstrated by MOCVD loading with (η 5 -C 5 H 5) Pd (η 3 -C 3 H 5) as Pd precursor to finally yield the palladium-loaded thin film material Pd@MOF-5/Al 2 O 3 as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.

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Hermes et al. (2007) studied this question.

synapsesocial.com/papers/6a7d28cb2c71273e4183db48https://doi.org/10.1021/cm062854+
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