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Low-temperature-grown Be-doped In0.53Ga0.47As/In0.52Al0.48As multiple quantum wells are investigated via wavelength-dependent time-resolved nonlinear absorption measurements. Annealed Be-doped material, in contrast to annealed undoped material, is found to retain the carrier lifetime reduction induced by low-temperature growth in this narrow-gap material system. This is attributed to Be–As complexes which, in addition to producing high resistivity material, provide anneal–stable trap states. We also report that ultrafast band-edge and photoinduced absorption effects can produce subpicosecond absorption recovery in material exhibiting much longer (20 ps) defect-meditated carrier trapping.
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Juodawlkis et al. (1996) studied this question.
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