Low Schottky barrier height for silicides on n-type Si (100) by interfacial selenium segregation during silicidation

The electron Schottky barrier height ΦBn modulation for NiSi and PtSi formed on selenium-implanted n-type Si (100) has been experimentally investigated. Selenium (Se) segregation is observed at the silicide/n-Si(100) interface during silicidation process. ΦBn of 83 and 120 meV were achieved for Se segregated NiSi and PtSi on n-Si (100) interfaces, respectively. Contrary to previously reported Fermi level depinning effect in monolayer Se-passivated n-Si (100), the low ΦBn achieved in this work points to metal silicide Fermi level pinning near to conduction band EC of n-Si (100).