An efficient way to increase the gas barrier properties of polymers is the development of silica barrier coatings; in fact inorganic barrier layers like SiN x and SiO x , usually obtained by PECVD, can decrease the gas permeation through polymeric substrates by several orders of magnitude. Nevertheless, the known costs of vacuum systems and in‐line processing needs have generated increasing interest to develop atmospheric condition alternatives. In this work results on deposition of SiO x on thin layers obtained by an atmospheric plasma jet as well as results on the gas permeation behaviour are presented. Obtained results, on the thickness and composition of the coatings, are evaluated under several deposition conditions.
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Scopece et al. (2009) studied this question.
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