A one-dimensional microhole array with high-aspect ratio was successfully obtained using anodic oxidation of an aluminum oxide/aluminum/glass structure. This process allows the fabrication of an array of microholes less than 1000 Å diameter without any exposure mask or resist, and the size of the array can be controlled on the basis of the relationship between the thickness of the aluminum layer and anodizing voltage.
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Masuda et al. (1993) studied this question.
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