Bit-array patterns with density over 1Tbit∕in.2 fabricated by extreme ultraviolet interference lithography

The use of patterned magnetic media in future data storage devices requires the fabrication of two-dimensional periodic patterns with resolution well below 35nm in terms of the pattern period. The authors have used extreme ultraviolet interference lithography based on transmission diffraction gratings to demonstrate arrays of structures in negative resists calixarene and hydrogen silsesquioxane. The produced patterns have density exceeding 1Tbit∕in.2. Analysis of structure size and position on one of the patterns indicates variations of subnanometer magnitude.