We have developed an oxidation apparatus with high reproducibility for fabricating oxide-confined vertical cavity surface emitting lasers (VCSELs). Precise control of AlAs oxidation can be realized for a high-performance VCSEL array in mass production. In this system, we introduce a vaporizer with a water mass flow controller for stable and precise control of H 2 O vapor. We have achieved good reproducibility and controllability. The run-to-run deviation of the oxidized window is ±0.1 µm for nominal ∼10.4 µm oxidation.
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Arai et al. (2000) studied this question.
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