Arrays of TiO 2 nanopillars have been prepared by photochemically etching a TiO 2 single crystal that had been previously imprinted with a corresponding array of dimples using SiC molds. The pillars have a high aspect ratio (see scanning electron microscopy (SEM) image in Figure) and the method is simple and suitable for high‐throughput production.
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Masuda et al. (2003) studied this question.
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