It has recently been reported that thin films of perfluoropolyethers can be bonded to a variety of substrates under illumination with 185-nm ultraviolet light. In the present work, the authors examine the mechanism through which the bonding of the perfluoropolyethers to the substrate takes place. The perfluoropolyethers undergo dissociative electron attachment caused by photoelectrons that are generated by the interaction of the ultraviolet light with the substrate. This dissociative electron attachment results in the formation of a negative ion and a radical. It is suggested that subsequent radical propagation and termination steps then cross-link the perfluoropolyether and bond it to the substrate.>
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Vurens et al. (1993) studied this question.
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