Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Wen-Di Li, Wei Wu, Richard Stanley Williams; Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns. Journal of Vacuum Science & Technology B 1 November 2012; 30 (6): 06F304. https://doi.org/10.1116/1.4758768 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology B Search Advanced Search |Citation Search