Scaling properties of the shadowing model for sputter deposition

We analyze a deterministic, one-dimensional solid-on-solid model for sputter deposition where the local growth rate is a function V({θ}) of the exposure angle {θ}. For long times an algebraic height distribution N(h){~}h^-(1+p) develops, where the exponent p depends on the behavior of V({θ}) close to {θ}={π} and the extremal statistics of the substrate roughness. Analytic predictions for p, based on scaling arguments, are verified by large-scale simulations using a hierarchical algorithm.