Thin films of transition metals (Ti, Cr, Ni, Nb, Mo, Ta) are bombarded with nitrogen and argon ions of energy 60 keV with dose range of 5 × 1015 to 5 × 1017 ions/cm2. The formation of chemical compounds causes both, the phase transformation and changes in the electrical properties of the films. The electrophysical and structural properties show a strong dependence on the conditions of film preparation.
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Belii et al. (1978) studied this question.
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