Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching

Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography.