Memory and negative photoconductivity effects of Ge nanocrystals embedded in ZrO2/Al2O3 gate dielectrics

Metal–insulator–semiconductor (MIS) structures containing Ge nanocrystals embedded in high permittivity dielectrics (ZrO2/Al2O3) are fabricated by electron-beam evaporation method. Capacitance–voltage (C–V) and I–V characteristics of the fabricated MIS structures are investigated in the dark and under illumination. Charge storing and negative photoconductivity effects of the Ge nanocrystals are experimentally demonstrated by the hysteresis in the C–V curves and the decrease of the current under illumination at a given voltage, respectively.