A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact organic field effect transistors

A novel and universal method, based on water-soluble poly(4-styrene sulfonate), was introduced into the preparation of a polymer mask. Using this mask, high-resolution, high-performance, bottom-gate, top-contact OFETs can be achieved. There is no solvent intervention in the process of manufacturing these OFETs and the mask can be recycled.