Characterizations and barrier properties of WN x film with varying nitrogen content have been examined in order to use the Al 12 W/WN x bilayer as a diffusion barrier in the contact system of Al/Si. The barrier properties of WN x film are evaluated from the viewpoint of the mass transport across the interfaces in the system of Al 12 W/WN x /Si, by comparing the depth profiles obtained from Auger electron spectroscopy (AES) analysis before and after the heat treatments at various temperatures. It is revealed from the comparison of depth profiles that thermal stabilities of the system are excellent up to 600°C, when the stoichiometric W 2 N compound film is used as the underlayer of the Al 12 W/WN x bilayer film.
No takes yet. Share an insight, caveat, or question.
Takeyama et al. (1992) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: