A versatile Kelvin probe for dynamic work function change measurements during gas adsorption and in situ film growth experiments

In the present work, we describe a new Kelvin probe for dynamical work function change (ΔΦ) measurements in ultrahigh vacuum. The construction of the Kelvin probe is especially optimized to meet the experimental conditions for gas-adsorption experiments as well as for in situfilm growth investigations during metal deposition. This is realized by a new setup which enables a change of the geometrical orientation of the vibrating reference electrode with respect to the sample surface. The Kelvin probe combined with thermal desorption spectroscopy, Auger electron spectroscopy, and scanning tunneling microscopy facilities, forms a powerful tool for film growth analysis. The performance of the instrumentation is demonstrated with some representative test experiments for copper deposition on Pt(111).