Interlayer lithography is used to pattern highly conductive, solution-processed, reduced graphene oxide source and drain electrodes down to 10 μm gaps. These patterned electrodes allow for the fabrication of high-performance organic thin-film transistors and complementary circuits. The method offers a viable route towards organic electronics fabricated entirely by solution processing.
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Wöbkenberg et al. (2011) studied this question.
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