Poly(methyl isopropenyl ketone) (PMIPK) degrades upon exposure to 5 keV electrons. Using a scanning electron microscope to expose fine‐line raster patterns in thin films of this polymer and subsequently solvent‐developing the thus‐degraded regions, sharp walled troughs are observed, the width of which is a measure of the sensitivity to degradation. Copolymers with several vinyl monomers were prepared and the sensitivities of these were similarly determined. Information relevant to the mechanism of depolymerization was obtained by comparing homopolymers with copolymers and by the use of additives in the irradiated polymer films. Examples of potential device‐fabrication techniques using PMIPK resist are given.
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Levine et al. (1974) studied this question.
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