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November 1, 1991Journal of The Electrochemical Society

Chemical‐Mechanical Polishing for Fabricating Patterned W Metal Features as Chip Interconnects

F. B. Kaufman Daniel B. Thompson R. E. Broadie M. Jaso W. L. Guthrie D.J. Pearson M. B. Small

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Abstract

Chemical‐Mechanical Polishing for Fabricating Patterned W Metal Features as Chip Interconnects, Kaufman, F. B., Thompson, D. B., Broadie, R. E., Jaso, M. A., Guthrie, W. L., Pearson, D. J., Small, M. B.

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Kaufman et al. (1991) studied this question.

synapsesocial.com/papers/6a82d16ad7a462ab0d8ae2ae https://doi.org/10.1149/1.2085434

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