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June 4, 1987Electronics Letters

Photoelectrochemical laser interference etching for fabrication of 235 nm diffraction gratings on n -InP

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LBL. BäcklinKista Photonics Research Center

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L. Bäcklin (1987) studied this question.

synapsesocial.com/papers/6a830ab8103ff40a2293c31fhttps://doi.org/10.1049/el:19870470
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