The formation of holographic surface relief gratings on thin films of a liquid-crystalline polymethacrylate with styrylpyridine side chains is described. A film of the polymer was treated with hydrogen chloride to protonate the side chain moieties, followed by holographic exposure to p-polarized Ar+ laser beams at 488 nm and by post-exposure baking to give rise to surface relief gratings. The depth of the surface relief in a typical case was 15 nm which is approximately 15% of the original film thickness. On the basis of the temperature dependence of diffraction efficiencies of the grating, the mechanism of the generation of the relief gratings is discussed.
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Yamaki et al. (2000) studied this question.
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