Structural Effects on the Barrier Properties of Self-Assembled Monolayers Formed from Long-Chain ω-Alkoxy-n-alkanethiols on Copper

The adsorption of long-chain omega-alkoxy-n-alkanethiols [CH(3)(CH(2))(p-1)O(CH(2))(m)SH; m = 11, 19, 22; p = 18, 22] onto copper produces self-assembled monolayers (SAMs) that can provide protection against corrosion of the underlying metal substrate. The resulting films are 40-60 A in thickness and are isostructural with SAMs formed on copper from unsubstituted n-alkanethiols. As evidenced by electrochemical impedance spectroscopy (EIS), the barrier properties of these ether-containing SAMs depend on the chain length of the adsorbate and the position of the ethereal unit along the hydrocarbon chain. For SAMs where the ether substitution is farther from the copper surface, the initial coating resistances are similar to those projected for unsubstituted n-alkanethiolate SAMs of similar thickness. For SAMs where the ether substitution is nearer to the copper surface (m = 11), the resistances are significantly less than those for unsubstituted n-alkanethiolate SAMs of similar thickness, reflecting the effect of the molecular structure on the barrier properties of the film. Upon exposure to 1 atm of O(2) at 100% RH, the SAMs become less densely packed as observed by infrared (IR) spectroscopy, and their barrier properties deteriorate as observed by EIS. The rate that the SAMs lose their barrier properties upon exposure to oxidizing conditions is correlated to the strength of intermolecular interactions within the bulk state of the adsorbate.