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January 1, 1995Nanotechnology

Fabrication of silicon nanostructures through scanning probe anodization followed by chemical etching

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Authors

HSHiroyuki SugimuraDokkyo UniversityNNNobuyuki NakagiriNikon (Japan)

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Sugimura et al. (1995) studied this question.

synapsesocial.com/papers/6a837137fe0f11dd66d0ff91https://doi.org/10.1088/0957-4484/6/1/005
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Maskless patterning of silicon surface based on scanning tunneling microscope tip-induced anodization and chemical etching1994 · 37 citations
  2. 2Modification of n-Si(100) Surface by Scanning Tunneling Microscope Tip-Induced Anodization under Nitrogen Atmosphere1994 · 33 citations
  3. 3Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air1990 · 735 citations
  4. 4Scanning tunneling microscope tip-induced anodization of titanium: Characterization of the modified surface and application to the metal resist process for nanolithography1994 · 40 citations
  5. 5Tip–sample forces in scanning probe microscopy in air and vacuum1992 · 82 citations