Thin-film deposition by a new laser ablation and plasma hybrid technique

We have developed a new laser ablation and plasma hybrid technique for depositing thin diamond-like carbon (DLC) films on Si〈100〉 substrates at room temperature and at 110 °C with improved optical and mechanical properties. The technique involves coupling of laser energy (λ=0.308 μm, pulse duration=40 ns, and power 125 MW/cm2) to a graphite target and superimposing capacitively stored energy (2–3 J at 3 kV) to the laser ablated spot. The laser- and plasma-deposited diamond-like carbon films were analyzed by spectroscopic ellipsometry and microhardness measurements. These films showed considerable improvements in both uniformity and homogeneity. Optical properties and hardness of the films deposited by this technique closely match the DLC films. We discuss possible causes of improvements in the above properties of these films.