Investigation of GaN Films Grown on Liquid-Phase Deposited SiO₂Nanopatterned Sapphire Substrates

A simple, easy and relatively inexpensive liquid phase deposition (LPD) method was used to introduce nano SiO 2 on sapphire substrates to fabricate nanoscale patterned sapphire substrates (PSS). Two kinds of nanoscale PSS were used to grow GaN, namely "NPOS" which is nano-pattern oxide on sapphire substrate and "NPSS" which is nano-patterned sapphire substrate. It was found that upper region of NPSS-GaN had the best quality. This is because as the growth time increased, laterally-grown GaN caused the threading dislocations to bend toward the patterns. Besides, voids formed on the NPSS pattern sidewalls caused more threading dislocation bending toward these voids.