Resistance fluctuations are reported for n-type doped hydrogenated amorphous silicon (a-Si:H) using a coplanar electrode configuration with effective sample volumes of 10^-6--{10}^{{{-}}7}$ ${cm}³. Random telegraph-switching noise is observed with fluctuations as large as δR/R~{10}^{{{-}}2}$ for the temperature range 350T425 K. Comparison of two-probe and four-probe measurements confirms that these results are not due to contact noise. The switching noise may result from inhomogeneous current paths arising from the hydrogen microstructure in the a-Si:H which change their resistance value as hydrogen atoms hop from one bonding configuration to another.
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Parman et al. (1991) studied this question.
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