Laser interference lithography is reviewed as an adequate nanopatterning tool for devices with periodic structures. The structure size may practically be chosen in the range between 100 nm and 10.0 µm by adjusting the angle of incidence of the incoming laser beam. The exposure method is fast, inexpensive, and applicable for large areas. The method may be used to fabricate microsieves, shadow masks, calibration grids, and photonic crystals.
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C.J.M. van Rijn (2006) studied this question.
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