X-ray diffraction was used to investigate the effect of nitrogen additions on the crystal structure and preferred orientation of FeMn films reactively sputtered in an Ar-N2 ambient. The fcc γ-FeMn phase was stabilized over a range of nitrogen pressures. The fcc FeMn(N) film was then used as a nucleation substrate for the deposition of an FeMn/Permalloy exchange coupled structure. A maximum exchange bias of 60–70 Oe was obtained when the FeMn(N) film was lattice matched to the γ-FeMn structure (a0=3.63 Å).
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Howard et al. (1988) studied this question.
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