Magnetic properties of Fe-Si-Ai alloy films fabricated by d.c. magnetron sputtering were systematically examined. Remarkable relaxation in coercive force, Hc, by annealing was found around 300∼400°C. Mechanisms of this sudden relaxation were discussed in connection with the phase transformations from disordered α (as-deposited) to ordered D03 structure. Precise concentration dependence of Hc in the films was clarified. Excellent soft magnetic properties, Hc ≅ 0.5 Oe and μeff> 1000 (5 MHz), were obtained at two different concentration: one is 9.0 wt%Si-5.7 wt%Al-bal. Fe and the other is 8.0 wt%Si-4.2 wt%Al-bal. Fe. The former concentration was found to be nearly the same as that of bulk Sendust alloys, while the latter is completely different from these alloys. Discussion was further developed on the concentration dependence of Hc, based on the concentration dependence of magnetocrystalline anisotropy, K1, and magnetostriction of the bulk single crystals.
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Takahashi et al. (1987) studied this question.
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