We report on the magnetoresistance (MR) properties of [Co(tCo)/Ag 1.5 nm]20multilayer and alloy films grown with the pulse electrochemical deposition on a polyamide substrate (1 cm2). The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.5 nm/Ag 1.5 nm]20showed a minimum hysteresis loss. The maximum MR ratio for Co/Ag was 9.2% at 1 kOe. A remarkable difference of magnetic field dependence of the magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves.
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Rizal et al. (2009) studied this question.
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