A sputtering system which utilizes a pair of helicon plasma cathodes has been developed for the fabrication of multilayer x-ray mirrors. The helicon plasma cathode consists of a conventional dc magnetron cathode and a radio frequency coil for a helicon wave. Contamination of thin films fabricated with the system are examined using Rutherford backscattering spectroscopy and x-ray fluorescence analysis. W/C multilayers having 2d spacings of 28–63 Å have been formed on Si substrates.
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Koike et al. (1995) studied this question.
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