Mo/Si multilayers deposited using electron beam evaporation in ultrahigh vacuum were used to study the formation of silicides at high temperatures, in situ in an analytical transmission electron microscope. Studies were carried out on cross-sectional as well as on end-on samples. We observed the origin of the formation of Mo5Si3 phase above 400 °C and nearly complete transformation at 750 °C in both the samples. Formation of Mo5Si3 phase was confirmed by selected area diffraction and high-resolution electron microscopy and by compositional analysis using energy dispersive x-ray analysis.
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Srivastava et al. (2002) studied this question.
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