Channeled-ion implantation of group-III and group-V ions into silicon

Implantation of group-III and group-V ions along [111] and [110] axes of silicon have been performed using a backscattering technique, and the depth profiles of implanted ions have been measured by the C-V method. The range of channeled Ga ions is the largest among the present data, and a p-type layer of about 6 μm is obtained by implantation at only 150 keV. The carrier profiles of channeled Al and Ga ions with deep ranges do not show any distinguishable channeled peak contrasting with the B, P, and As channeling which gives a well-defined peak. The electronic stopping cross section (Se) of channeled P ions agree well with the results of Eisen and Reddi, but in B channeling, the discrepancies of 10–20% are observed among Se values obtained experimentally by three different groups.