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A study was made of the efficiency of conversion of target-heating laser radiation into x rays emitted by a plasma in a wide range of laser radiation power densities (5×1011–2×1014 W/cm2) and atomic numbers of the target material (4–92). Estimates were obtained of the exposure dose needed for x-ray photolithography of resists when such a laser-plasma source of soft x rays was used.
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Basov et al. (1982) studied this question.
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